Testing methods

Spectral ellipsometry (SE)

Procedural principle

Imaging ellipsometer for area distribution measurements (Large image)

Spectral ellipsometry allows the determination of thicknesses of transparent layer systems and of optical and dielectric material constants in general. The required information is achieved by the measurement of the changes of amplitude and the phase of polarised light upon reflection on a surface.

Several ellipsometric configurations meet different and specific demands of measurement, e.g. also in transmission, and cover a broad range of application fields.

Thickness distribution by imaging-ellipsometry: a sub-nanometer step of a SiO2 film on silicon (large image)

Ellipsometric spectra of an amorphous carbon layer, an investigation of diamond-like layers (large image)


Instrument	Mapping M-2000	Gonio-Spektral VASE	Imaging / AFM EP3 SE	Laser Sentech	FTIR SE-900
Spectral range	192 nm to1694 nm	User-defined	350 nm to1000 nm	632,8 nm	400 cm^-1 to 6060 cm^-1
Resolution	± 4 nm	± 5 nm	Discrete wave lengths	---	1 cm^-1/ 32 cm^-1
Optical principles	RCE	RAE	NE	SL	„Step-scan“ -RAE
Fields of application	Measurement of liquids, temperature control	Transmission measurements	High local resolution , combination with AFM	fast	Infrared range

Technical Data


Instrument	Mapping ellipsometer M-2000 (Woollam)
Spectral range	192 nm to 1694 nm in 760 discrete wave length spaces
Resolution	± 4 nm
Method	RCE (Rotating Compensator Ellipsometry)
Specifics	Automatic goniometer; fast measurement; automatical xy-stage for mapping; automatic measurements and analyses; liquid cell, heating / cooling cell


Instrument	Gonio spectral ellipsometer VASE (Woollam)
Spectral range	190 nm to 1620 nm
Resolution	± 5 nm
Method	RAE (Rotating Analyser Ellipsometry)
Specifics	Automatic goniometer; user-defined wave lengths; suitable for transmission measurements


Instrument	Imaging ellipsometer / AFM EP3 SE (Nanofilm)
Spectral range	350 nm to 1000 nm
Spectral resolution	44 discrete wave length within range; additional single wave length: diode laser 635 nm
Microscopic resolution	2 µm lateral (at 50-fold (50x) magnification), lens 50x, 20x, 10x, 5x, 2.5x available
Method	Null ellipsometry (NE)
Specifics	Automatic goniometer; imaging ellipsometry, liquid cell, SPR (Surface Plasmon Resonance) cell


Instrument	Single wave length ellipsometer (Sentech)
Wave length	632,8 nm (He-Ne-Laser)
Specifics	Narrowband light source, quick measurement and analysis


Instrument	FTIR ellipsometer SE-900 (Sentech)
Spectral range	400 cm^-1 to 6060 cm^-1 (25000 nm to 1650 nm)
Resolution	Selectable between 1 cm^-1 and 32 cm^-1
Method	„Step-scan“-RAE. spectral resolution with FTIR (Fourier-Transformations-Infrarot) spectrometer
Specifics	Automatical goniometer; measurement within medium IR range

Division 6.7 | Testing methods layer thickness | BAM Testing facilities

2012-05-10

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